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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Investigation of novel inorganic resist materials for EUV lithography

Wood, Obert R., Panning, Eric M., Krysak, Marie E., Blackwell, James M., Putna, Steve E., Leeson, Michael J., Younkin, Todd R., Harlson, Shane, Frasure, Kent, Gstrein, Florian

Year:

2014

Language:

english

File:

PDF, 1.92 MB

english, 2014

2

Lithographic stochastics: beyond 3σ

Bristol, Robert L., Krysak, Marie E.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2017

Language:

english

File:

PDF, 1.47 MB

english, 2017

3

The first close-up images of Jupiter's polar regions: Results from the Juno mission JunoCam instrument

Orton, Glenn S., Hansen, Candice, Caplinger, Michael, Ravine, Michael, Atreya, Sushil, Ingersoll, Andrew P., Jensen, Elsa, Momary, Thomas, Lipkaman, Leslie, Krysak, Daniel, Zimdar, Robert, Bolton, Sco

Journal:

Geophysical Research Letters

Year:

2017

Language:

english

File:

PDF, 442 KB

english, 2017

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - A new inorganic EUV resist with high-etch resistance

Trikeriotis, Markos, Krysak, Marie, Chung, Yeon Sook, Ouyang, Christine, Cardineau, Brian, Brainard, Robert, Ober, Christopher K., Giannelis, Emmanuel P., Cho, Kyoungyong, Naulleau, Patrick P., Wood I

Year:

2012

Language:

english

File:

PDF, 1.80 MB

english, 2012

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Development of an inorganic nanoparticle photoresist for EUV, e-beam, and 193nm lithography

Krysak, Marie, Allen, Robert D., Somervell, Mark H., Trikeriotis, Markos, Schwartz, Evan, Lafferty, Neal, Xie, Peng, Smith, Bruce, Zimmerman, Paul, Montgomery, Warren, Giannelis, Emmanuel, Ober, Chris

Year:

2011

Language:

english

File:

PDF, 2.34 MB

english, 2011

6

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Environmentally friendly natural materials-based photoacid generators for next-generation photolithography

Cho, Youngjin, Allen, Robert D., Somervell, Mark H., Ouyang, Christine Y., Krysak, Marie, Sun, Wenjie, Gamez, Victor, Sierra-Alvarez, Reyes, Ober, Christopher K.

Year:

2011

Language:

english

File:

PDF, 630 KB

english, 2011

7

Learning to Love Your Discovery Tool: Strategies for Integrating a Discovery Tool in Face-To-Face, Synchronous, and Asynchronous Instruction

Fawley, Nancy, Krysak, Nikki

Journal:

Public Services Quarterly

Year:

2014

Language:

english

File:

PDF, 312 KB

english, 2014

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Molecular glass resists for next-generation lithography

Krysak, Marie, Henderson, Clifford L., De Silva, Anuja, Sha, Jing, Lee, Jin-Kyun, Ober, Christopher K.

Year:

2009

Language:

english

File:

PDF, 425 KB

english, 2009

9

Multicomponent Physical Vapor Deposited Films with Homogeneous Molecular Material Distribution Featuring Improved Resist Sensitivity

Tristan Kolb, Christian Neuber, Marie Krysak, Christopher K. Ober, Hans-Werner Schmidt

Journal:

Advanced Functional Materials

Year:

2012

Language:

english

File:

PDF, 2.07 MB

english, 2012

10

Gas-phase surface functionalization of multi-walled carbon nanotubes with vacuum UV photo-oxidation

Krysak, M., Parekh, B., Debies, T., Dileo, R. A., Landi, B. J., Raffaelle, R. P., Takacs, G. A.

Journal:

Journal of Adhesion Science and Technology

Year:

2007

Language:

english

File:

PDF, 1.01 MB

english, 2007

11

Environmentally friendly patterning of thin films in linear methyl siloxanes

Ouyang, Christine Y., Lee, Jin-Kyun, Krysak, Marie E., Sha, Jing, Ober, Christopher K.

Journal:

Journal of Materials Chemistry

Year:

2012

Language:

english

File:

PDF, 263 KB

english, 2012

12

Information Literacy Opportunities within the Discovery Tool Environment

Fawley, Nancy, Krysak, Nikki

Journal:

College & Undergraduate Libraries

Year:

2012

Language:

english

File:

PDF, 95 KB

english, 2012

13

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Tightly bound ligands for hafnium nanoparticle EUV resists

Cardineau, Brian, Krysak, Marie, Trikeriotis, Markos, Giannelis, Emmanuel, Ober, Christopher K., Cho, Kyoungyong, Brainard, Robert, Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 1.01 MB

english, 2012

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Solvent development processing of chemically amplified resists: chemistry, physics, and polymer science considerations

Ober, Christopher K., Allen, Robert D., Somervell, Mark H., Ouyang, Christine, Lee, Jin-Kyun, Krysak, Marie

Year:

2011

Language:

english

File:

PDF, 1.78 MB

english, 2011

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Extending resolution limits of EUV resist materials

Wood, Obert R., Panning, Eric M., Krysak, Marie, Leeson, Michael, Han, Eungnak, Blackwell, James, Harlson, Shane

Year:

2015

Language:

english

File:

PDF, 9.01 MB

english, 2015

16

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning

Chakrabarty, Souvik, Naulleau, Patrick P., Ouyang, Christine, Krysak, Marie, Trikeriotis, Markos, Cho, Kyoungyoung, Giannelis, Emmanuel P., Ober, Christopher K.

Year:

2013

Language:

english

File:

PDF, 855 KB

english, 2013

17

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Development of an inorganic photoresist for DUV, EUV, and electron beam imaging

Trikeriotis, Markos, Bae, Woo Jin, Schwartz, Evan, Krysak, Marie, Lafferty, Neal, Xie, Peng, Smith, Bruce, Zimmerman, Paul A., Ober, Christopher K., Giannelis, Emmanuel P., Allen, Robert D.

Year:

2010

Language:

english

File:

PDF, 3.71 MB

english, 2010

18

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - All-dry processible and PAG-attached molecular glasses for improved lithographic performance

Krysak, Marie, Kolb, Tristan, Neuber, Christian, Schmidt, Hans-Werner, Ober, Christopher K., Allen, Robert D.

Year:

2010

Language:

english

File:

PDF, 7.48 MB

english, 2010

19

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Patterning conventional photoresists in environmentally friendly silicone fluids

Ouyang, Christine Y., Allen, Robert D., Somervell, Mark H., Lee, Jin-Kyun, Krysak, Marie, Ober, Christopher K.

Year:

2011

Language:

english

File:

PDF, 1.33 MB

english, 2011

20

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - Investigation of acid diffusion during laser spike annealing with systematically designed photoacid generators

Krysak, Marie, Jung, Byungki, Thompson, Michael O., Ober, Christopher K., Somervell, Mark H., Wallow, Thomas I.

Year:

2012

Language:

english

File:

PDF, 1.28 MB

english, 2012

21

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Lithographic stochastics: beyond 3σ

Panning, Eric M., Goldberg, Kenneth A., Bristol, Robert L., Krysak, Marie E.

Year:

2017

Language:

english

File:

PDF, 674 KB

english, 2017

22

Lithography Performance and Environmental Compatibility of PFOS-Free Photoacid Generators

Sun, Wenjie, Cho, Youngjin, Krysak, Marie, Ouyang, Christine Y, Sierra-Alvarez, Reyes, Ober, Christopher K

Journal:

Green Materials

Year:

2017

Language:

english

File:

PDF, 919 KB

english, 2017

23

Investigation of a novel oral airway for awake flexible bronchoscopy

McKay, William P., Krysak, Trevor, Tyan, Chung-Chun

Journal:

Canadian Journal of Anesthesia/Journal canadien d'anesthésie

Year:

2020

File:

PDF, 454 KB

2020